By Samares Kar
"The e-book comprehensively covers all of the present and the rising components of the physics and the expertise of excessive permittivity gate dielectric fabrics, together with, issues equivalent to MOSFET fundamentals and features, hafnium-based gate dielectric fabrics, Hf-based gate dielectric processing, steel gate electrodes, flat-band and threshold voltage tuning, channel mobility, high-k gate stack degradation and reliability, lanthanide-based high-k gate stack fabrics, ternary hafnia and lanthania established high-k gate stack motion pictures, crystalline high-k oxides, excessive mobility substrates, and parameter extraction. each one bankruptcy starts with the fundamentals worthwhile for figuring out the subject, by way of a complete overview of the literature, and eventually graduating to the present prestige of the know-how and our clinical realizing and the longer term prospects."
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